In recent years,
the development trend of electronic semiconductors continues to pursue
miniaturization, high efficiency, low consumption and low cost. Because through
Silicon Via (TSV) uses laser to drill holes in wafers or chips, and then fills
conductive materials into the holes to form conductive paths, which vertically
connect the upper and lower surfaces of the same chip to facilitate the stacking
of multiple chips, this technology is called three-dimensional integrated
circuit (3D IC) construction technology. Compared with the previous multi-chip
packaging, three-dimensional packaging technology can shorten the signal
transmission path through stacking of multiple chips, make the signal
transmission faster, and reduce the space occupied by the package. These
advantages make 3D IC become the technology developed by various semiconductor
manufacturers, and also become the key to maintain the competitiveness of the
domestic IC manufacturing and sealing industry.
Semiconductor factories, such as TSMC, Sunlight, Silicon, Licheng, etc., have actively constructed 2.5D and 3D IC sealing capacity in recent years. In addition, other semiconductor manufacturers such as Samsung, Erbida and Intel have also invested in the development and production of 3D IC. It is expected that 3D IC products will become the mainstream electronic goods of the next generation.
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